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During the last two decades, photophysical and photochemical processes have become increasingly important in many branches of polymer chemistry. Tremendous advances have been made in our understanding of the theory of photoreactions and they now have many practical applications in, for example, the synthesis of photoresists for microcircuitry, polymers for xerography, photocuring of paints and resins, photodegradation and photodestabilization of polymers.
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Mechanisms of Photophysical Processes and Photochemical Reactions in Polymers, Jan F. Rabek
- Langue
- Année de publication
- 1987
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- (rigide),
- État du livre
- Abîmé
- Prix
- 6,21 €
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- Titre
- Mechanisms of Photophysical Processes and Photochemical Reactions in Polymers
- Sous-titre
- Theory and Applications
- Langue
- Anglais
- Auteurs
- Jan F. Rabek
- Éditeur
- John Wiley & Sons Ltd
- Publié
- 1987
- Format
- rigide
- Pages
- 756
- ISBN10
- 0471911801
- ISBN13
- 9780471911807
- Séries
- Mots clés
- Technologie & Ingénierie, Science, Chimie
- Description
- During the last two decades, photophysical and photochemical processes have become increasingly important in many branches of polymer chemistry. Tremendous advances have been made in our understanding of the theory of photoreactions and they now have many practical applications in, for example, the synthesis of photoresists for microcircuitry, polymers for xerography, photocuring of paints and resins, photodegradation and photodestabilization of polymers.